Faculty of Engineering (FE) organized a webinar titled “Low Temperature and Precise Thin Film Synthesis by Plasma Assisted Atomic Layer Deposition (ALD)” on June 23, 2022 (Thursday) at 6 pm on the zoom platform. The purpose of this webinar was to discuss the latest technology involved in semiconductor material synthesis and possible optimal power outcomes. Mr. Nafiz Ahmed Chisty (Associate Professor, Head in charge (UG), Dept. of EEE, Faculty of Engineering, AIUB) warmly welcomed the speaker and participants.
Alumnus of Department of EEE, AIUB Mr. Adnan Mohammad (Graduate Assistant and Ph.D. Candidate, ALEng Lab, Department of Electrical and Computer Engineering, University of Connecticut, USA) began his speech by stating the importance of plasma ALD as the technology of thickness in nanometers is shrinking nowadays. He provided a brief introduction, applications of thin-film deposition, and the atomic layer deposition method for binary materials. He emphasized the applications, objectives, and experimental details, inside growth chamber post-annealing experiments, and outside PLD chamber post-annealing experiments based on plasma deposition at low temperature. Then the speaker further discussed the results, plasma chemistry scan and power scan in growth reactor for vanadium oxide (VOX) plasma and Boron Nitride (BN) to grow in plasma ALD at low temperature. The speaker concluded his speech with the constraints when high temperature is applied under high resolution. The webinar was hosted by Ms. Sushmita Ghosh (Assistant Professor, EEE, Faculty of Engineering, AIUB). The speaker answered suggestive questions from the participants and the discussion led to an interactive session giving light to more advanced research ideas on this field of study.
Following that, Ms Sushmita Ghosh thanked the honorable speaker and presented a token of appreciation to the speaker concluding the webinar.
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